Our Technology
Principles
OSMOS X has developed its own ion thruster technology called electro-plasmic, enabling high-thrust and high-Isp never seen before.
The electro-plasmic technology uses the Electron Cyclotron Resonance (ECR) phenomena to generates a highly-charged plasma. This technology created in France has been used for the past 40 years on ground and underground particle accelerators
ECR plasma sources are reliable systems, using:
- A microwave and a gas flow injected into a chamber to generate the plasma.
- A magnetic confinement to avoid any physical contact between ions and hardware components.
- A high voltage extraction (without grid) to create the thrust.
Depending on parameters, fully stripped ions can be created
Competitive Advantages
Very high efficiency / Isp
Unlike other technologies, the plasma is more confined, which generates very efficient multi-charged ions that ensure a very high Isp (Specific Impulse). In other words, our technology uses much less gas than any other one on the market.
Powerful thrust
With cutting-edge expertise in plasma extraction and acceleration, OSMOS X technology delivers exceptionally high beam currents — unlocking powerful thrust.
Flexibility
Ion charging states are entirely adjustable, which make OSMOS X thrusters fully flexible in terms of thrust and efficiency / Isp.
Robustness and lifespan
OSMOS X technology ensures an unrivalled control of plasma confinement, with no contact between ions and any hardware part and, therefore, very high robustness and lifespan.